Entegris, JSR cross-license EUV lithography metal oxide resist patents

Entegris, Inc.

Entegris, Inc.

ENTG

0.00
  • Entegris entered a non-exclusive cross-licensing agreement with JSR’s Inpria to support EUV lithography in next-generation chipmaking.
  • The deal cross-licenses metal oxide resist patents, ends an inter partes review dispute (IPR2025-00267).
  • The companies will explore joint development of future photoresist materials, targeting more reliable high-volume EUV manufacturing.


Disclaimer: This news brief was created by Public Technologies (PUBT) using generative artificial intelligence. While PUBT strives to provide accurate and timely information, this AI-generated content is for informational purposes only and should not be interpreted as financial, investment, or legal advice. Entegris Inc. published the original content used to generate this news brief via Business Wire (Ref. ID: 202605261910BIZWIRE_USPR_____20260526_BW876476) on May 26, 2026, and is solely responsible for the information contained therein.

This page is machine-translated. Sahm tries to improve but does not guarantee the accuracy and reliability of the translation, and will not be liable for any loss or damage caused by any inaccuracy or omission of the translation. *Disclaimer: The above content only represents the author's personal position and opinion and does not represent any position of Sahm Capital Financial Company and Sahm cannot confirm the authenticity, accuracy, and originality of the above content. Investors should consider the risks of investment products in light of their circumstances before making any investment decisions. When necessary, please consult a professional investment advisor. Sahm does not provide any investment advice, nor does it make any commitments and guarantees.