Lam Research's Aether Dry Photoresist Technology Selected By Leading Memory Manufacturer For Advanced DRAM Processes In EUV Lithography

Lam Research Corporation

LRCX

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Lam Research Corporation (NASDAQ:LRCX) today announced that Aether®, its innovative dry photoresist technology, has been selected by a leading memory manufacturer as production tool of record for the most advanced DRAM processes. A breakthrough introduced by Lam in 2020, dry resist extends the resolution, productivity, and yield of Extreme Ultraviolet (EUV) lithography, a pivotal technology used in the production of next-generation semiconductor devices.

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