Toppan Photomask Inks Agreement With IBM For Joint R&D On Semiconductor EUV Photomasks

IBM Corp -10.90%
TOPPAN PRINTING CO 0.00%

IBM Corp

IBM

224.40

-10.90%

TOPPAN PRINTING CO

TONPF

27.74

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Toppan Photomask, the world's premier semiconductor photomask provider, announced that it has entered into a joint research and development agreement with IBM related to the 2 nanometer (nm) logic semiconductor node, using extreme ultraviolet (EUV) lithography. This agreement also includes High-NA EUV photomask development capability on next-generation semiconductors.

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